Formation of composite tungsten films

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United States of America Patent

PATENT NO 7384867
APP PUB NO 20050287807A1
SERIAL NO

11206491

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Abstract

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Methods for the deposition of tungsten films are provided. The methods include depositing a nucleation layer by alternatively adsorbing a tungsten precursor and a reducing gas on a substrate, and depositing a bulk layer of tungsten over the nucleation layer.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Byun, Jeong Soo Cupertino, CA 64 5549
Chang, Mei Saratoga, CA 279 30427
Chung, Hua San Jose, CA 203 14401
Fang, Hongbin Mountain View, CA 24 1444
Gelatos, Avgerinos Redwood City, CA 16 3636
Kori, Moris Palo Alto, CA 25 1268
Lai, Ken K Milpitas, CA 6 317
Mak, Alfred W Union City, CA 43 4011
Sinha, Ashok K Palo Alto, CA 56 4714
Srinivas, Ramanujapuran A San Jose, CA 3 200
Wu, Frederick C Cupertino, CA 17 2628
Xi, Ming Palo Alto, CA 101 11215
Yang, Michael X Fremont, CA 131 7803

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