Lithographic apparatus and device manufacturing method that limits a portion of a patterning device used to pattern a beam
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United States of America Patent
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Jun 10, 2008
Grant Date -
Jun 29, 2006
app pub date -
Feb 15, 2006
filing date -
Jun 20, 2003
priority date (Note) -
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Abstract
A system and method are used to limit a proportion of a programmable patterning means used to pattern a substrate. This is done such that a size of a repeated pattern to be exposed on the substrate is an integer multiple of a size of a pattern exposed on the substrate by the patterned beam.
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