Lithographic apparatus and device manufacturing method
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United States of America Patent
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Jun 17, 2008
Grant Date -
May 25, 2006
app pub date -
Dec 29, 2005
filing date -
Apr 16, 2004
priority date (Note) -
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Abstract
A lithographic apparatus includes a patterning device that patterns a projected beam. The patterning device includes an array of cells that contain a polar fluid, a non-polar fluid, and an electrode. A potential difference across the electrode and the polar fluid causes displacement of the non-polar fluid. Based on a difference in refractive index between the polar fluid and the non-polar fluid, a beam of light which passes through the cell will have its phase changed in dependence on the relative thickness on the polar and non-polar fluids and on their refractive indices.
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