Method and arrangement for controlling a glow discharge plasma under atmospheric conditions

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7399944
APP PUB NO 20060081566A1
SERIAL NO

11202366

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention is directed to a method and arrangement for controlling a glow discharge plasma in a gas or gas mixture under atmospheric conditions, in a plasma discharge space comprising at least two spaced electrodes in which at least one plasma pulse having an absolute pulse maximum is generated by applying an AC plasma energizing voltage to the electrodes causing a plasma current and a displacement current. The plasma is controlled by providing a relative decrease of the displacement current after the pulse maximum. In a preferred embodiment, the energizing voltage is applied through a series circuit including a choke coil and a non-saturable inductor.

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Patent Owner(s)

Patent OwnerAddress
FUJI PHOTO FILM B VOUDENSTAART 1 TILBURG 5047 TK

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Aldea, Eugen Eindhoven, NL 18 198
Bouwstra, Jan Bastiaan Bilthoven, NL 55 388
DeVries, Hindrik Willem Tilburg, NL 2 30
Kamiyama, Yoichiro Tilburg, NL 6 42
Peeters, Paul Eindhoven, NL 5 74
Van, de Sanden Mauritius Cornelius Maria Tilburg, NL 19 582

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