Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry
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United States of America Patent
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Jul 29, 2008
Grant Date -
Mar 15, 2007
app pub date -
Aug 8, 2006
filing date -
Aug 8, 2005
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A wavefront interferometry system including: a wavefront interferometer that during operation combines a reference beam from a reference object and a measurement beam from a measurement object to generate a combined beam; and a processor system programmed to processes the combined beam to concurrently generate therefrom a control signal and information about the difference in wavefront profiles of the reference and measurement objects, wherein the control signal controls a system parameter so as to maintain an optical path length difference between a spot on the reference object and a corresponding spot on the measurement object at a constant value mod 2.pi..
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