Method of removing photoresist and photoresist rework method
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United States of America Patent
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Aug 19, 2008
Grant Date -
Feb 1, 2007
app pub date -
Jul 27, 2005
filing date -
Jul 27, 2005
priority date (Note) -
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status (Latency Note)
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Abstract
A method of removing photoresist is provided. In the whole process of removing the photoresist, plasma is not used. Instead, a first solution is used in a first removal step to remove a photoresist layer. Then, a second solution is used in a second removal step to completely remove the photoresist layer. The first solution and the second solution have different polarities, and the polarity of the first solution is large than that of the second solution.
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