Self-cleaning colloidal slurry composition and process for finishing a surface of a substrate
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United States of America Patent
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Aug 26, 2008
Grant Date -
Apr 17, 2003
app pub date -
Oct 12, 2001
filing date -
Oct 12, 2001
priority date (Note) -
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Abstract
A self-cleaning colloidal slurry and process for finishing a surface of a glass, ceramic, glass-ceramic, metal or alloy substrate for use in a data storage device, for example. The slurry comprises a carrying fluid, colloidal particles, etchant, and a surfactant adsorbed and/or precipitated onto a surface of the colloidal particles and/or substrate. The surfactant has a hydrophobic section that forms a steric hindrance barrier and substantially prevents contaminates, including colloidal particles, from bonding to the substrate surface. The slurry is applied to the surface of the substrate while a pad mechanically rubs the surface. Subsequent cleaning with standard soap solutions removes substantially all remaining contamination from the substrate surface. In an exemplary embodiment, the slurry is used to superfinish a glass disk substrate to a surface roughness of less than 2 .ANG., with substantially no surface contamination as seen by atomic force microscopy (AFM) after standard soap cleaning steps.
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