Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing
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United States of America Patent
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Sep 9, 2008
Grant Date -
Nov 23, 2006
app pub date -
May 17, 2005
filing date -
May 17, 2005
priority date (Note) -
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Abstract
A method of processing a workpiece includes introducing an optical absorber material precursor gas into a chamber containing the workpiece, generating an RF oscillating toroidal plasma current in a reentrant path that includes a process zone overlying the workpiece by applying RF source power, so as to deposit a layer of an optical absorber material on the workpiece, and exposing the workpiece to optical radiation that is at least partially absorbed in the optical absorber layer.
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