Ion beam monitoring in an ion implanter using an imaging device
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United States of America Patent
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Sep 9, 2008
Grant Date -
Mar 13, 2008
app pub date -
Mar 14, 2006
filing date -
Mar 14, 2006
priority date (Note) -
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Abstract
An image monitor system monitors characteristics of an ion beam employed in ion implantation. The monitored characteristics can include particle count, particle information, beam current intensity, beam shape, and the like. The system includes one or more image sensors that capture frames or images along a beam path of an ion beam. An image analyzer analyzes the captured frames to obtain measured characteristics. A controller determines adjustments or corrections according to the measured characteristics and desired beam characteristics.
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