Cleaning solution of silicon germanium layer and cleaning method using the same
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United States of America Patent
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Oct 14, 2008
Grant Date -
Oct 27, 2005
app pub date -
Apr 13, 2005
filing date -
Apr 14, 2004
priority date (Note) -
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Abstract
Disclosed are a cleaning solution for preventing damage of a silicon germanium layer when cleaning a semiconductor device including the silicon germanium layer and a cleaning method using the same. The cleaning solution of a silicon germanium layer includes from about 0.01 to about 2.5 percent by weight of a non-ionic surfactant with respect to 100 percent by weight of the cleaning solution, about 0.05 to about 5.0 percent by weight of an alkaline compound with respect to the cleaning solution and a remaining amount of pure water. The damage to an exposed silicon germanium layer can be prevented when cleaning a silicon substrate having a silicon germanium layer. Impurities present on the surface portion of the silicon germanium layer can be effectively removed.
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