Method and apparatus for inspecting a pattern
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United States of America Patent
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Oct 14, 2008
Grant Date -
Dec 20, 2007
app pub date -
Jun 12, 2007
filing date -
Jun 20, 2006
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An apparatus for inspecting a fine pattern with a simple configuration is provided. The apparatus mainly comprises a scanning unit for scanning a surface of the pattern using a light spot, a reflection detecting unit for detecting one of the light beams having been separated from a light beam reflected at the pattern and outputting a first light intensity signal, an astigmatism detecting unit for creating a second light intensity signal including a phase information on the other light beam having been separated, and an image processing unit for creating an inspection result of the pattern based on the first and second light intensity signals.
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