Multiple band pass filtering for pyrometry in laser based annealing systems
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United States of America Patent
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Oct 21, 2008
Grant Date -
May 18, 2006
app pub date -
Aug 2, 2005
filing date -
Nov 12, 2004
priority date (Note) -
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Abstract
A thermal processing system includes a source of laser radiation emitting at a laser wavelength, beam projection optics disposed between the reflective surface and a substrate support capable of holding a substrate to be processed, a pyrometer responsive to a pyrometer wavelength, and a wavelength responsive optical element having a first optical path for light in a first wavelength range including the laser wavelength, the first optical path being between the source of laser radiation and the beam projection optics, and a second optical path for light in a second wavelength range including the pyrometer wavelength, the second optical path being between the beam projection optics and the pyrometer. The system can further include a pyrometer wavelength blocking filter between the source of laser radiation and the wavelength responsive optical element.
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