X-ray diffraction measurement method and X-ray diffraction apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7443952
APP PUB NO 20080084964A1
SERIAL NO

11868659

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

Disclosed is an X-ray diffraction apparatus that irradiates a sample with X-ray emitted from an X-ray source by resting the X-ray using a divergence slit and detects diffracted X-ray generated from the sample using an X-ray detector. The divergence angle of the divergence slit is a fixed value, and the divergence slit is a slit that restricts the X-ray irradiation width in the sample width direction. The sample is arranged in a longitudinally-elongated manner in which its sample width is smaller than a standard sample width and its sample height is the same as a standard sample height. X-ray intensity calculated based on an output of the X-ray detector is compensated based on an effective divergence angle calculated based on the sample width to thereby obtain true X-ray intensity.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
RIGAKU CORPORATIONAKISHIMA-SHI TOKYO 196-8666

International Classification(s)

  • [Classification Symbol]
  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dosho, Akihide Tokyo, JP 4 41
Kakefuda, Koji Tokyo, JP 1 19

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation