Process and apparatus for forming nanoparticles using radiofrequency plasmas
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United States of America Patent
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Nov 4, 2008
Grant Date -
Mar 9, 2006
app pub date -
Jun 17, 2005
filing date -
Jun 18, 2004
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Abstract
Methods and apparatus for producing nanoparticles, including single-crystal semiconductor nanoparticles, are provided. The methods include the step of generating a constricted radiofrequency plasma in the presence of a precursor gas containing precursor molecules to form nanoparticles. Single-crystal semiconductor nanoparticles, including photoluminescent silicon nanoparticles, having diameters of no more than 10 nm may be fabricated in accordance with the methods.
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