Multi-menisci processing apparatus
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United States of America Patent
Stats
-
Dec 16, 2008
Grant Date -
Sep 21, 2006
app pub date -
May 18, 2006
filing date -
Sep 30, 2002
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A substrate preparation apparatus is provided. The apparatus includes a housing configured to be installed in a substrate fabrication facility. The housing includes a manifold for use in preparing a wafer surface. The manifold is configured to include a first process window in a first portion of the manifold. A first fluid meniscus is capable of being defined within the first process windowl. Further included is a second process window in a second portion of the manifold. A second fluid meniscus is capable of being defined within the second process window. An arm is integrated with the housing, and the arm is coupled to the manifold, such that the arm is capable of positioning the manifold in proximity with the substrate during operation. The apparatus therefore provides for the formation of multi-menisci over the surface of a substrate using a single manifold.
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