Sputtering target material
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United States of America Patent
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Dec 16, 2008
Grant Date -
Mar 25, 2004
app pub date -
Mar 15, 2002
filing date -
Mar 16, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Provided is a sputtering target material which has a high reflectance and which is excellent in a sulfurization resistance, comprising an Ag alloy prepared by alloying Ag with a specific small amount of the metal component (A) selected from In, Sn and Zn, a specific small amount of the metal component (B) selected from Au, Pd and Pt and, if necessary, a small amount of Cu.
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