Plasma immersion ion implantation process
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United States of America Patent
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-
Dec 16, 2008
Grant Date -
Apr 20, 2006
app pub date -
Jan 28, 2005
filing date -
Aug 11, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method of processing a workpiece includes placing the workpiece on a workpiece support pedestal in a main chamber with a gas distribution showerhead, introducing a process gas into a remote plasma source chamber and generating a plasma in the remote plasma source chamber, transporting plasma-generated species from the remote plasma source chamber to the gas distribution showerhead so as to distribute the plasma-generated species into the main chamber through the gas distribution showerhead, and applying plasma RF power into the main chamber.
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