System and method for forming multi-component dielectric films
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United States of America Patent
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Dec 30, 2008
Grant Date -
Mar 24, 2005
app pub date -
Apr 21, 2004
filing date -
Apr 21, 2003
priority date (Note) -
Expired
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Abstract
The present invention provides systems and methods for mixing precursors such that a mixture of precursors are present together in a chamber during a single pulse step in an atomic layer deposition (ALD) process to form a multi-component film. The precursors are comprised of at least one different chemical component, and such different components will form a mono-layer to produce a multi-component film. In a further aspect of the present invention, a dielectric film having a composition gradient is provided.
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