Exposure method, substrate stage, exposure apparatus, and device manufacturing method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 27, 2009
Grant Date -
Jun 29, 2006
app pub date -
Dec 9, 2005
filing date -
Jun 13, 2003
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully