Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method
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United States of America Patent
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Jan 27, 2009
Grant Date -
Nov 15, 2007
app pub date -
May 9, 2006
filing date -
May 9, 2006
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Abstract
A displacement measurement system, in particular for measuring the displacement of a substrate table in a lithographic apparatus relative to a reference frame is presented. The displacement measure system includes a plurality of displacement sensors mounted to the substrate table and a target associated with each displacement sensor mounted to the reference frame.
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