Ellipsometric investigation of very thin films
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United States of America Patent
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Jan 27, 2009
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N/A
app pub date -
Mar 16, 2007
filing date -
Jan 31, 2003
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Abstract
Use of spectroscopic data obtained by investigation of a witness sample having a relatively thick dielectric on a surface thereof during deposition of a thin film onto the witness sample and onto a process sample having no, or a relatively thin dielectric on its surface, in characterizing thin film deposited onto the process sample.
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