Method of fabricating a free-standing microstructure
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United States of America Patent
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Feb 17, 2009
Grant Date -
Apr 13, 2006
app pub date -
Aug 5, 2005
filing date -
Sep 27, 2004
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Provided is a MEMS device comprising an integrated post and deformable layer. In some embodiments, the transition between the post and deformable layer comprises substantially a single arcuate or convex surface, thereby providing a mechanically robust structure. Some embodiments provide a method for fabricating a MEMS device comprising the use of a self-planarizing sacrificial material, which provides a surface conducive to the formation of a relatively uniform deformable layer thereon.
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