Plasma-assisted doping
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United States of America Patent
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Feb 24, 2009
Grant Date -
Mar 23, 2006
app pub date -
May 7, 2003
filing date -
May 8, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various doping processes. In one embodiment, a substrate (250) can be doped by forming a plasma (610) in a cavity (285) by subjecting a gas to an amount of electromagnetic radiation in the presence of a plasma catalyst (240) and adding at least one dopant material to the plasma. The material is then allowed to penetrate into the substrate. Various active and passive catalysts are provided.
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