Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping

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United States of America Patent

PATENT NO 7499146
APP PUB NO 20060203220A1
SERIAL NO

11252877

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The tilt and position of individually controllable element are simultaneously adjusted to allow a greater range of contrasts to be achieved. This can also be used to compensate for cupping of individually controllable elements. Simultaneous adjustment of both the position and tilt of the individually controllable elements can be achieved by two electrodes operable over a range of values.

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Patent Owner(s)

  • ASML HOLDING N.V.;ASML NETHERLANDS B.V.;AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baselmans, Johannes Jacobus Matheus Oirschot , NL 160 4008
Bleeker, Arno Jan Westerhoven , NL 99 2903
Callan, Neal Lake Oswego , US 12 142
Eib, Nicholas K San Jose , US 25 1602
Markoya, Louis Sandy Hook , US 12 74
Troost, Kars Zeger Waalre , NL 33 477

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