Method for preparing a poled structure by using leakage and tunnel effects

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United States of America Patent

PATENT NO 7502163
SERIAL NO

11938738

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Abstract

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A method for preparing a poled structure forms a ferroelectric substrate with a first polarization direction, wherein the ferroelectric substrate has a first surface and a second surface. An electrode-patterning process is then performed to form a first electrode structure on the first surface, and the first electrode structure includes a plurality of active blocks and a plurality of passive blocks, wherein at least one passive block is sandwiched between two active blocks. Subsequently, a poling process is performed including applying a predetermined voltage to the active blocks and floating the passive blocks such that a current such as a leakage current or a tunnel current is generated from the active blocks to the passive blocks to form a plurality of inverted domains with a second polarization direction in the ferroelectric substrate.

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Patent Owner(s)

Patent OwnerAddress
HC PHOTONICS CORP4F NO 2 KEJI 5TH ROAD EAST DISTRICT HSINCHU 300

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chou, Ming Hsien Hsinchu, TW 19 37
Hong, Tsai Hau Hsinchu, TW 1 0
Lin, Tze Chia Hsinchu, TW 11 9

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