Projection exposure system and method of manufacturing a miniaturized device
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United States of America Patent
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Mar 24, 2009
Grant Date -
May 11, 2006
app pub date -
Oct 13, 2005
filing date -
Oct 13, 2004
priority date (Note) -
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Abstract
A projection exposure system and method of manufacturing a miniaturized device using the projecting exposure system uses an imaging of a patterning structure onto a substrate using a projection optical system. Measuring light is directed through the projection optical system to be incident on the substrate and measuring light reflected from the substrate is superimposed with reference light to generate an interference pattern. The interference pattern is analyzed to determine imaging properties of the projecting optical system. Actuators of the projection optical system may be used to improve the imaging characteristics.
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