Lithographic apparatus and device manufacturing method utilized to reduce quantization influence of datapath SLM interface to dose uniformity
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United States of America Patent
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Mar 24, 2009
Grant Date -
Oct 18, 2007
app pub date -
Apr 12, 2006
filing date -
Apr 12, 2006
priority date (Note) -
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Abstract
A lithography method and system comprise an array of individually controllable elements, a first datapath section, a second datapath section, and a quantization device. The array of individually controllable elements modulates a beam of radiation. The first datapath section converts data defining a requested dose pattern into a stream of setpoint data defining a desired sequence of setpoints for the array of individually controllable elements. The second datapath section stores and reproduces the stream of setpoint data for the array of individually controllable elements. The quantization device digitizes the stream of setpoint data before it is passed from the first datapath section to the second datapath section. The first datapath section further comprises a noise controller configured to incorporate noise of a predetermined magnitude into the stream of setpoint data before it is digitized by the quantization device.
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