Apparatus for developing photoresist and method for operating the same
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United States of America Patent
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Apr 21, 2009
Grant Date -
Nov 30, 2006
app pub date -
Aug 15, 2005
filing date -
Jun 30, 2000
priority date (Note) -
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status (Latency Note)
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Abstract
A first proximity head is configured to define a meniscus of a photoresist developer solution on a substrate. The meniscus is to be defined between a bottom of the first proximity head and the substrate. A second proximity head is configured to define a rinsing meniscus on the substrate and remove the rinsing meniscus from the substrate. The second proximity head is positioned to follow the first proximity head relative to a traversal direction of the first and second proximity heads over the substrate. Exposure of the substrate to the meniscus of photoresist developer solution causes previously irradiated photoresist material on the substrate to be developed to render a patterned photoresist layer. The first and second proximity heads enable precise control of a residence time of the photoresist developer solution on the substrate during the development process.
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