Photomask and manufacturing method thereof, fabrication process of an electron device
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United States of America Patent
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Apr 28, 2009
Grant Date -
Jul 6, 2006
app pub date -
May 11, 2005
filing date -
Jan 5, 2005
priority date (Note) -
Expired
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Abstract
A photomask made by using a negative photoresist includes a transparent substrate defined with a device chip area, an opaque device pattern formed on the transparent substrate in the device chip area, and a dummy opaque pattern provided on the transparent substrate outside of the device chip area.
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