Monitoring apparatus and method particularly useful in photolithographically
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United States of America Patent
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Apr 28, 2009
Grant Date -
Feb 21, 2008
app pub date -
Oct 25, 2007
filing date -
Jul 14, 1998
priority date (Note) -
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Abstract
Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.
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