Manufacturing method of a liquid crystal display device using a photo resist having regions with different thicknesses, ashing, and reflow processing
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United States of America Patent
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May 12, 2009
Grant Date -
May 29, 2008
app pub date -
Jan 25, 2008
filing date -
Apr 26, 2001
priority date (Note) -
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Abstract
a−Si layer, and a drain electrode metal layer and forming a drain line and an island by performing patterning, ashing processing, reflow processing using photolithography, and peeling; forming an insulating film on a transparent insulating substrate and forming an insulating film contact used to provide a connection to a source electrode of an island at a specified position by patterning or a printing method; forming a transparent conductive film and forming a pixel electrode and common electrode by patterning using photolithography.
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