Method of separating an exposed thermal transfer assemblage
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 19, 2009
Grant Date -
Apr 23, 2009
app pub date -
Oct 19, 2007
filing date -
Oct 19, 2007
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
In a method of using a donor element in a radiation-induced thermal transfer process, an assemblage is provided that includes a donor element and a receiver element, wherein the donor element has a support layer and a transfer layer having one side adjacent the support layer and the other side adjacent the receiver element. After image-wise exposing the assemblage to radiation whereby a portion of the transfer layer is transferred to the receiver element, relative movement between the support layer and the receiver element is provided before separating the donor element from the receiver element. Advantages include improved edge straightness, image width predictability, improved thermal mass transfer, and improved color filters.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully