System and method for rule-based data mining and problem detection for semiconductor fabrication
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United States of America Patent
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May 26, 2009
Grant Date -
Dec 18, 2008
app pub date -
Jun 14, 2007
filing date -
Jun 14, 2007
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A fabrication history of a group of wafers is provided, having a record for each wafer of the manufacturing events that did or did not occur in its fabrication, and having the measured value of a given target. A binary decision rule is formed based on the fabrication history, the rule being that if a wafer has a particular pattern of manufacturing events in its fabrication history then the statistic of the given fabrication target for that wafer is a first value; otherwise, the statistic is a second value having at least a given distance from the first value. The pattern of manufacturing events in the binary decision rule is identified in the generation of the binary decision rule. The identified pattern is significant with respect to the given target.
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