System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode
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United States of America Patent
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Jun 2, 2009
Grant Date -
Aug 3, 2006
app pub date -
Jan 31, 2005
filing date -
Jan 31, 2005
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Abstract
A system and method for patterning a beam of radiation based on a pupil field distribution. In an embodiment, the distribution of the field in an area of the pupil plane affecting an image and an illumination mode are selected so as to render an image with desired characteristics. Additionally and/or alternatively, an illumination mode is selected so as to render an image with desired characteristics. The distribution of the field in an area of the pupil plane affecting an image is then realized using the spatial light modulator The system and method include using an illumination system, a pattern generator, and a projector. The illumination system supplies a beam of radiation. The pattern generator patterns the beam of radiation based on a data set corresponding to a field distribution in a pupil plane. The projector projects the patterned beam onto a target portion of an object.
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