Patterning apparatuses and methods for the same
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United States of America Patent
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Jun 2, 2009
Grant Date -
Feb 23, 2006
app pub date -
Aug 17, 2005
filing date -
Feb 28, 2003
priority date (Note) -
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status (Latency Note)
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Abstract
An apparatus for patterning a workpiece may include at least two spatial light modulators. The at least two spatial light modulators may receive and relay electromagnetic radiation from an electromagnetic radiation source toward a workpiece. The electromagnetic radiation may be split into at least two beams in an optical plane between the at least two spatial light modulators and at least one of an illuminator pupil and a conjugate optical plane. Each of the at least two spatial light modulators may receive a corresponding one of the at least two beams.
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