Apparatus for controlling the forces applied to a vacuum-assisted pad conditioning system
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United States of America Patent
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Jun 9, 2009
Grant Date -
N/A
app pub date -
Nov 18, 2005
filing date -
May 29, 2003
priority date (Note) -
In Force
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Abstract
An apparatus for conditioning polishing pads that utilizes an apertured conditioning disk for introducing operation-specific slurries, without the need for additional tooling, platens, and materials handling. The apparatus utilizes a vacuum capability to pull waste material out of the polishing pad and through the apertured conditioning disk to evacuate the apparatus through an outlet port. The apparatus also includes a force adjustment system for providing measurement and control of the force applied by the conditioning disk to the polishing pad.
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