Method and apparatus for measurement of crossfield chromatic response of projection imaging systems
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United States of America Patent
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Jun 9, 2009
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app pub date -
Nov 14, 2005
filing date -
Nov 12, 2004
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Abstract
A method and apparatus for measuring the chromatic response of lithographic projection imaging systems is described. An apparatus for determining the lens aberrations for a lithographic projection lens is provided. A substrate coated with a suitable recording media is provided. A series of lithographic exposures are performed using an exposure source with variable spectral settings. The exposures are measured, and the measurements are used to determine a chromatic response of the projection imaging system.
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