Self-aligned process for fabricating imprint templates containing variously etched features
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United States of America Patent
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Jun 16, 2009
Grant Date -
Oct 18, 2007
app pub date -
Mar 29, 2007
filing date -
Apr 18, 2006
priority date (Note) -
In Force
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Abstract
A process that enables coplanarization of the structures that have been created in multiple independent etch steps. The various etches are performed independently by selectively exposing only certain patterns to particular etching conditions. After these structures have been created, it is possible that the various structures will exist at different planes/elevations relative to the template surface. The elevations of the various structures may be adjusted independently by selectively exposing “higher” structures to an anisotropic etch that reduces the overall elevation of the structures, while preserving the structural topography.
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