Method and apparatus for improved baffle plate
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United States of America Patent
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Jun 30, 2009
Grant Date -
Jun 8, 2006
app pub date -
Dec 8, 2004
filing date -
Dec 8, 2004
priority date (Note) -
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Abstract
An apparatus related to plasma chambers used for processing semiconductor substrates and specifically to improvements in pumping baffle plates used in plasma sources. An apparatus and method for making a baffle plate assembly formed from a modified baffle plate blank wherein a variety of pumping features are formed in the baffle plate blank and opened in a planar material removal operation.
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