Device structures including ruthenium silicide diffusion barrier layers

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Jul 14, 2009
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Jun 23, 2000
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Aug 27, 1998

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Abstract

, where x is in the range of about 0.01 to about 10. Capacitor electrodes, interconnects or other structures may be formed with such a diffusion barrier layer.

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MICRON TECHNOLOGY, INC.

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
Marsh, Eugene P	Boise , US	225	5794
Vaartstra, Brian A	Nampa , US	158	9781

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Device structures including ruthenium silicide diffusion barrier layers

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United States of America Patent

09603132

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SERIAL NO	09603132
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09603132

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