Process and structure for fabrication of MEMS device having isolated edge posts
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United States of America Patent
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Jul 14, 2009
Grant Date -
Apr 24, 2008
app pub date -
Dec 19, 2007
filing date -
Jun 1, 2006
priority date (Note) -
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Abstract
A method of fabricating an array of MEMS devices includes the formation of support structures located at the edge of upper strip electrodes. A support structure is etched to form a pair of individual support structures located at the edges of a pair of adjacent electrodes. The electrodes themselves may be used as a hard mask during the etching of these support structures. A resultant array of MEMS devices includes support structures having a face located at the edge of an overlying electrode and coincident with the edge of the overlying electrode.
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