Method of forming a carbon nanotube-based contact to semiconductor

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United States of America Patent

PATENT NO 7563711
APP PUB NO 20090173964A1
SERIAL NO

11708929

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Manufacturers encounter limitations in forming low resistance ohmic electrical contact to semiconductor material P-type Gallium Nitride (p-GaN), commonly used in photonic applications, such that the contact is highly transparent to the light emission of the device. Carbon nanotubes (CNTs) can address this problem due to their combined metallic and semiconducting characteristics in conjunction with the fact that a fabric of CNTs has high optical transparency. The physical structure of the contact scheme is broken down into three components, a) the GaN, b) an interface material and c) the metallic conductor. The role of the interface material is to make suitable contact to both the GaN and the metal so that the GaN, in turn, will make good electrical contact to the metallic conductor that interfaces the device to external circuitry. A method of fabricating contact to GaN using CNTs and metal while maintaining protection of the GaN surface is provided.

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Patent Owner(s)

  • NANTERO, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Meinhold, Mitchell Arlington , US 27 1273
Schlatka, Benjamin Boston , US 25 2173
Segal, Brent M Woburn , US 130 5557
Smith, Robert F Odessa , US 118 1719
Ward, Jonathan W Fairfax , US 59 1770

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