Method and apparatus for providing precursor gas to a processing chamber
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United States of America Patent
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Aug 4, 2009
Grant Date -
Jan 8, 2009
app pub date -
Sep 18, 2008
filing date -
Jul 17, 2002
priority date (Note) -
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Abstract
Embodiments of the invention provide a method and an apparatus for generating a gaseous chemical precursor for a processing system. In one embodiment, an apparatus for generating the gaseous chemical precursor used in a vapor deposition processing system is provided and includes a canister having a sidewall, a top, and a bottom encompassing an interior volume therein, an inlet port and an outlet port in fluid communication with the interior volume, and an inlet tube extending from the inlet port into the canister, wherein the inlet tube contains an outlet positioned to direct a gas flow away from the outlet port and towards the sidewall of the canister.
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