Methods of making a MEMS device by monitoring a process parameter
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United States of America Patent
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Aug 4, 2009
Grant Date -
Dec 25, 2008
app pub date -
Jun 22, 2007
filing date -
Jun 22, 2007
priority date (Note) -
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Abstract
Embodiments of the present invention relate to methods and systems for making a microelectromechanical system MEMS device comprising supplying an etchant to etch one or more sacrificial structures of the system in a chamber. A process parameter relating to the pressure within the chamber is monitored as a function of time to provide an indication of the extent of the etching of the one or more sacrificial structures.
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