Lithographic apparatus and device manufacturing method
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United States of America Patent
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Aug 11, 2009
Grant Date -
Jan 19, 2006
app pub date -
Jul 13, 2004
filing date -
Jul 13, 2004
priority date (Note) -
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status (Latency Note)
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Abstract
A lithographic apparatus and method comprise an illumination system arranged to provide a radiation beam, a support structure configured to support a product patterning device and a metrology target patterning device. The product patterning device imparts a radiation beam derived from the illumination system with a product pattern in its cross-section representing features of a product device to be formed. The metrology target patterning device imparts the radiation beam with a metrology target pattern in its cross-section representing at least one metrology target. The product patterning device is separate from the metrology target patterning device. A substrate table holds a substrate. A projection system project the radiation patterned by the product patterning device and the metrology target patterning device onto a target portion of the substrate. A metrology target patterning device controller adjusts the metrology target pattern independently of the product pattern.
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