Vacuum-assisted pad conditioning system
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United States of America Patent
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Aug 18, 2009
Grant Date -
Dec 6, 2007
app pub date -
Aug 13, 2007
filing date -
May 29, 2003
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A method and apparatus for conditioning polishing pads that utilize an apertured conditioning disk for introducing operation-specific slurries, without the need for additional tooling, platens, and materials handling. The method and apparatus utilize a vacuum capability to pull waste material out of the conditioning pad and through the apertured conditioning disk to evacuate the apparatus through an outlet port, the apparatus may also include self-contained flushing means and a piezo-electric device for vibrating the pad conditioning apparatus.
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