Lithographic apparatus and device manufacturing method
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United States of America Patent
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Aug 18, 2009
Grant Date -
Sep 11, 2008
app pub date -
May 1, 2008
filing date -
May 30, 2003
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.
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