Source and drain side early boosting using local self boosting for non-volatile storage

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United States of America Patent

PATENT NO 7577026
APP PUB NO 20080278999A1
SERIAL NO

12060487

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Abstract

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Program disturb is reduced during programming of non-volatile storage by providing a boosting scheme in which isolation voltage are applied to two word lines to create a source side channel region on a source side of one isolation word line, an intermediate channel region between the isolation word lines and a drain side channel region on a drain side of the other isolation word line. Further, during a programming operation, the source and drain side channel regions are boosted early while the intermediate channel region is boosted later, when a program pulse is applied. This approach prevents charge leakage from the intermediate channel region to the source side, avoiding disturb of already programmed storage elements, while also allowing electrons to flow from the intermediate channel region to the drain side channel region, which makes the boosting of the intermediate channel region easier.

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Patent Owner(s)

  • SANDISK TECHNOLOGIES LLC

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dong, Yingda Sunnyvale, US 252 4837
Lutze, Jeffrey W San Jose, US 96 3623

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