US Patent No: 7,582,555

Number of patents in Portfolio can not be more than 2000

CVD flowable gap fill

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Abstract

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The present invention meets these needs by providing improved methods of filling gaps. In certain embodiments, the methods involve placing a substrate into a reaction chamber and introducing a vapor phase silicon-containing compound and oxidant into the chamber. Reactor conditions are controlled so that the silicon-containing compound and the oxidant are made to react and condense onto the substrate. The chemical reaction causes the formation of a flowable film, in some instances containing Si—OH, Si—H and Si—O bonds. The flowable film fills gaps on the substrates. The flowable film is then converted into a silicon oxide film, for example by plasma or thermal annealing. The methods of this invention may be used to fill high aspect ratio gaps, including gaps having aspect ratios ranging from 3:1 to 10:1.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
NOVELLUS SYSTEMS, INC.SAN JOSE, CA1026

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Barnes, Michael San Ramon , US 87 2002
Huang, Judy H Los Gatos , US 37 1033
Lang, Chi-I Sunnyvale , US 108 599
Shanker, Sunil Santa Clara , US 56 270

Cited Art Landscape

Patent Info (Count) # Cites Year
 
INTERNATIONAL BUSINESS MACHINES CORPORATION (2)
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6,218,268 Two-step borophosphosilicate glass deposition process and related devices and apparatus 39 1998
 
AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD. (1)
* 6,858,195 Process for forming a low dielectric constant fluorine and carbon-containing silicon oxide dielectric material 5 2001
 
NOVELLUS SYSTEMS, INC. (1)
7,074,690 Selective gap-fill process 29 2004
 
MICRON TECHNOLOGY, INC. (2)
* 6,383,951 Low dielectric constant material for integrated circuit fabrication 83 1998
6,300,219 Method of forming trench isolation regions 95 1999
 
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (1)
* 7,074,727 Process for improving dielectric properties in low-k organosilicate dielectric material 7 2003
 
GLOBALFOUNDRIES INC. (1)
6,828,162 System and method for active control of BPSG deposition 20 2001
 
SAMSUNG ELECTRONICS CO., LTD. (1)
5,902,127 Methods for forming isolation trenches including doped silicon oxide 67 1996
 
TRIKON EQUIPMENTS LIMITED (3)
6,242,366 Methods and apparatus for treating a semiconductor substrate 25 1999
6,475,564 Deposition of a siloxane containing polymer 24 2000
6,544,858 Method for treating silicon-containing polymer layers with plasma or electromagnetic radiation 24 2000
 
TRIKON TECHNOLOGIES LIMITED (2)
5,858,880 Method of treating a semi-conductor wafer 87 1996
5,932,289 Method for filling substrate recesses using pressure and heat treatment 26 1997
 
TELEDYNE DALSA SEMICONDUCTOR, INC. (1)
5,320,983 Spin-on glass processing technique for the fabrication of semiconductor devices 46 1992
 
QIMONDA AG (1)
6,790,737 Method for fabricating thin metal layers from the liquid phase 19 2003
 
UNITED MICROELECTRONICS CORP. (1)
5,899,751 Method for forming a planarized dielectric layer 21 1997
 
RPX CORPORATION (1)
6,143,626 Method of manufacturing a semiconductor device using a trench isolation technique 26 1999
 
SANDISK 3D LLC (1)
* 6,984,561 Method for making high density nonvolatile memory 72 2004
 
APPLIED MATERIALS, INC. (7)
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* 6,660,663 Computer readable medium for holding a program for performing plasma-assisted CVD of low dielectric constant films formed from organosilane compounds 30 2000
* 6,448,187 Method of improving moisture resistance of low dielectric constant films 56 2001
* 7,498,273 Formation of high quality dielectric films of silicon dioxide for STI: usage of different siloxane-based precursors for harp II—remote plasma enhanced deposition processes 44 2006
2007/0281,495 FORMATION OF HIGH QUALITY DIELECTRIC FILMS OF SILICON DIOXIDE FOR STI: USAGE OF DIFFERENT SILOXANE-BASED PRECURSORS FOR HARP II - REMOTE PLASMA ENHANCED DEPOSITION PROCESSES 55 2006
 
NEC ELECTRONICS CORPORATION (1)
4,740,480 Method for forming a semiconductor device with trench isolation structure 65 1987
 
TOKYO ELECTRON LIMITED (5)
5,874,367 Method of treating a semi-conductor wafer 130 1994
6,287,989 Method of treating a semiconductor wafer in a chamber using hydrogen peroxide and silicon containing gas or vapor 19 1998
6,640,840 Delivery of liquid precursors to semiconductor processing reactors 23 2000
6,653,247 Dielectric layer for a semiconductor device and method of producing the same 23 2001
6,846,757 Dielectric layer for a semiconductor device and method of producing the same 16 2003
* Cited By Examiner

Patent Citation Ranking

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Patent Info (Count) # Cites Year
 
NOVELLUS SYSTEMS, INC. (13)
7,888,273 Density gradient-free gap fill 11 2007
8,557,712 PECVD flowable dielectric gap fill 6 2008
7,888,233 Flowable film dielectric gap fill process 15 2009
7,915,139 CVD flowable gap fill 48 2009
8,278,224 Flowable oxide deposition using rapid delivery of process gases 15 2009
8,187,951 CVD flowable gap fill 9 2009
8,728,958 Gap fill integration 1 2010
8,481,403 Flowable film dielectric gap fill process 3 2011
8,580,697 CVD flowable gap fill 4 2011
8,685,867 Premetal dielectric integration process 2 2011
8,846,536 Flowable oxide film with tunable wet etch rate 1 2012
9,064,684 Flowable oxide deposition using rapid delivery of process gases 0 2012
8,809,161 Flowable film dielectric gap fill process 1 2013
 
PS4 LUXCO S.A.R.L. (1)
8,580,649 Method for manufacturing semiconductor device 0 2012
 
AIR PRODUCTS AND CHEMICALS, INC. (1)
8,993,072 Halogenated organoaminosilane precursors and methods for depositing films comprising same 0 2012
 
APPLIED MATERIALS, INC. (5)
8,329,587 Post-planarization densification 3 2010
8,466,067 Post-planarization densification 6 2011
8,765,573 Air gap formation 3 2011
9,018,108 Low shrinkage dielectric films 0 2013
8,921,235 Controlled air gap formation 0 2013
 
ASM IP HOLDING B.V. (1)
9,117,657 Method for filling recesses using pre-treatment with hydrocarbon-containing gas 0 2013
* Cited By Examiner

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