CVD flowable gap fill

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO

7582555

SERIAL NO

11323812

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Abstract

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The present invention meets these needs by providing improved methods of filling gaps. In certain embodiments, the methods involve placing a substrate into a reaction chamber and introducing a vapor phase silicon-containing compound and oxidant into the chamber. Reactor conditions are controlled so that the silicon-containing compound and the oxidant are made to react and condense onto the substrate. The chemical reaction causes the formation of a flowable film, in some instances containing Si—OH, Si—H and Si—O bonds. The flowable film fills gaps on the substrates. The flowable film is then converted into a silicon oxide film, for example by plasma or thermal annealing. The methods of this invention may be used to fill high aspect ratio gaps, including gaps having aspect ratios ranging from 3:1 to 10:1.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
NOVELLUS SYSTEMS, INC.SAN JOSE, CA1068

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Barnes, Michael San Ramon , US 91 2541
Huang, Judy H Los Gatos , US 37 1546
Lang, Chi-I Sunnyvale , US 113 1171
Shanker, Sunil Santa Clara , US 56 721

Cited Art Landscape

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NOVELLUS SYSTEMS, INC. (1)
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TRIKON TECHNOLOGIES LIMITED (2)
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RPX CORPORATION (1)
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* Cited By Examiner

Patent Citation Ranking

Forward Cite Landscape

Patent Info (Count) # Cites Year
 
LAM RESEARCH CORPORATION (1)
9245739 Low-K oxide deposition by hydrolysis and condensation 2 2014
 
NOVELLUS SYSTEMS, INC. (15)
7888273 Density gradient-free gap fill 19 2007
8557712 PECVD flowable dielectric gap fill 13 2008
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8187951 CVD flowable gap fill 25 2009
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8481403 Flowable film dielectric gap fill process 6 2011
8580697 CVD flowable gap fill 9 2011
8685867 Premetal dielectric integration process 7 2011
9257302 CVD flowable gap fill 0 2012
8846536 Flowable oxide film with tunable wet etch rate 7 2012
9064684 Flowable oxide deposition using rapid delivery of process gases 2 2012
8809161 Flowable film dielectric gap fill process 6 2013
9299559 Flowable oxide film with tunable wet etch rate 0 2014
 
PS4 LUXCO S.A.R.L. (1)
* 2015/0236,022 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF 0 2013
 
AIR PRODUCTS AND CHEMICALS, INC. (2)
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* Cited By Examiner

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