Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers
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United States of America Patent
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Sep 8, 2009
Grant Date -
Oct 6, 2005
app pub date -
Mar 31, 2004
filing date -
Mar 31, 2004
priority date (Note) -
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Abstract
Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers are disclosed herein. In one embodiment, an ampoule includes a vessel having an interior volume configured to receive a precursor with a headspace above the precursor. The ampoule further includes a carrier gas inlet for flowing carrier gas into the vessel, a conduit having an opening in the precursor and an outlet in the headspace, and a means for flowing precursor through the conduit and into the headspace to increase the surface area of the precursor exposed to the carrier gas.
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